SciTech Connect

Title: Direct to Digital Holography

Direct to Digital Holography In this Cooperative Research and Development Agreement (CRADA), Oak Ridge National Laboratory (ORNL) assisted nLine Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-to-digital holographic (DDH) techniques invented at ORNL. Key components of this work included, testing of DDH for detection of defects in High Aspect Ratio (HAR) structures, development of image processing techniques to enhance detection capabilities through the use of both phase and intensity, and development of methods for autofocus on the DDH tools.
Authors: ;
Publication Date:
OSTI Identifier:OSTI ID: 932949
Report Number(s):C/ORNL-0560
TRN: US200918%%70
DOE Contract Number:DE-AC05-00OR22725
Resource Type:Technical Report
Research Org:Oak Ridge National Laboratory (ORNL), Oak Ridge, TN
Sponsoring Org:USDOE - Office of Science (SC)
Country of Publication:United States
Language:English
Subject: 99 GENERAL AND MISCELLANEOUS; ASPECT RATIO; DEFECTS; DETECTION; HOLOGRAPHY; IMAGE PROCESSING; ORNL; TESTING