Evaluation of SmCo and SmCoN magnetron sputtering coatings for SOFC interconnect applications

Journal Article · Thu Jan 10 00:00:00 EST 2008 · Journal of Power Sources

DOI:https://doi.org/10.1016/j.jpowsour.2007.09.105· OSTI ID:925575

Wu, Junwei ^[1]; Jiang, Yinglu ^[2]; Johnson, C D; Liu, Xingbo ^[1]

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1. West Virginia Univ., Morgantown, WV
2. Univ. of Science and Technology, Beijing, China

Cobalt or cobalt containing coatings are promising for SOFC interconnect applications because of their high conductivity. We have investigated SmCo and SmCoN coatings deposited by magnetron sputtering from a SmCo (5% Sm) target on to Crofer 22 APU substrates. The composition, structure, surface morphology, and electrical conductivity of the coated substrates were characterized by SEM/EDX, XRD and ASR measurements. Addition of Sm enhances the oxidation resistance and the Cr retention capability of the coatings. The use of nitride as a precursor stabilizes Sm during oxidation of the films, thus inhibiting diffusion of Fe, resulting in a more compact coating and lowering ASR. The combined advantages of Sm addition to cobalt and the use of a nitride as a precursor, makes SmCoN coatings a promising new interconnect coating material.

• Research Organization: National Energy Technology Laboratory (NETL), Pittsburgh, PA, Morgantown, WV, and Albany, OR (United States)
• Sponsoring Organization: USDOE - Office of Fossil Energy (FE)
• DOE Contract Number: None cited
• OSTI ID: 925575
• Report Number(s): DOE/NETL-IR-2008-086
• Journal Information: Journal of Power Sources, Vol. 175, Issue 2; ISSN 0378-7753
• Publisher: Elsevier B.V.
• Country of Publication: United States
• Language: English

Related Subjects

CHEMISORPTION
PENTACENE
SILICON
SORPTIVE PROPERTIES
MORPHOLOGY
ADSORPTION HEAT
Interconnect
Magnetron
Sputtering
SmCo
SmCoN