At the limit of nondispersive micro and nanofocusing mirror optics.
We describe x-ray Kirkpatrick-Baez mirror designs with the potential to produce hard x-ray beams of 40 nm or smaller. The x-ray quality mirrors required to achieve the desired performance can be fabricated by differential deposition on ultra-smooth surfaces, or by differential polishing. Various mirror systems designed for nanofocusing to {approx}40 nm and below are compared. The performance limits of total-external-reflection mirrors are compared with the limits of multilayer mirrors that can potentially focus to an even smaller spot size. The advantages of side-by-side Kirkpatrick-Baez mirrors are evaluated and more advanced, four-mirror systems with significantly greater geometrical demagnification are discussed. These systems can potentially reach 5 - 20 nm focal spot sizes for multilayer and total-external-reflection optics respectively.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 925172
- Report Number(s):
- ANL/XFD/CP-113905; TRN: US200807%%62
- Resource Relation:
- Conference: SPIE's 10th Annual International Symposium (SPIE 2003); Aug 3-8, 2003; San Diego, CA
- Country of Publication:
- United States
- Language:
- ENGLISH
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