Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes

Patent · Tue Mar 28 00:00:00 EST 1989

OSTI ID:7268840

Tsuo, S; Langford, A A

Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate. 3 figs.

• DOE Contract Number: AC02-83CH10093
• Assignee: Midwest Research Inst., Kansas City, MO (United States)
• Patent Number(s): US 4816294; A
• Application Number: PPN: US 7-045823
• OSTI ID: 7268840
• Resource Relation: Patent File Date: 4 May 1987
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL REACTORS
WINDOWS
MATERIALS
CHEMICAL VAPOR DEPOSITION
CLEANING
ETCHING
SUBSTRATES
CHEMICAL COATING
DEPOSITION
OPENINGS
SURFACE COATING
SURFACE FINISHING
360101* - Metals & Alloys- Preparation & Fabrication
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture