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Title: Ordering and disordering of doped Ga[sub 0. 5]In[sub 0. 5]P

Journal Article · · Journal of Electronic Materials (A.I.M.E. Metallurgical Society); (United States)
DOI:https://doi.org/10.1007/BF02671225· OSTI ID:7236255
; ; ; ;  [1]
  1. National Renewable Energy Lab., Golden, CO (United States)

The band gap of Ga[sub 0.5]In[sub 0.5]P is reported as a function of doping level and growth rate. The lowest band gaps are obtained for hole concentrations of about 2 x 10[sup 17] cm[sup [minus]3]. For samples doped p-type above 1 x 10[sup 18] cm[sup [minus]3], the band gap increases dramatically, regardless of growth rate. This effect is shown to be the result of disordering during growth rather than a change in the equilibrium surface structure with doping. The doping level dependence of the band gap of Ga[sub 0.5]In[sub 0.5]P samples grown at higher and lower growth rates differs for selenium and zinc doping even though the effects of high doping are the same for both dopants. 22 refs., 3 figs.

DOE Contract Number:
AC02-83CH10093
OSTI ID:
7236255
Journal Information:
Journal of Electronic Materials (A.I.M.E. Metallurgical Society); (United States), Vol. 23:5; ISSN 0361-5235
Country of Publication:
United States
Language:
English