Method of sputter etching a surface

Patent · Tue Feb 14 00:00:00 EST 1984

OSTI ID:7157408

Henager, Jr, C H

The surface of a target is textured by co-sputter etching the target surface with a seed material adjacent thereto, while the target surface is maintained at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion. 4 figs.

• DOE Contract Number: AC06-76RL01830
• Assignee: Dept. of Energy, Washington, DC (United States)
• Patent Number(s): US 4431499; A
• Application Number: PPN: US 6-352738
• OSTI ID: 7157408
• Resource Relation: Patent File Date: 26 Feb 1982
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
SOLAR ABSORBERS
ETCHING
MATERIALS
SOLAR THERMAL CONVERSION
TEMPERATURE CONTROL
CONTROL
CONVERSION
ENERGY CONVERSION
EQUIPMENT
SOLAR ENERGY CONVERSION
SOLAR EQUIPMENT
SURFACE FINISHING
140700* - Solar Thermal Power Systems
140900 - Solar Thermal Utilization