skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Radiation damage of epitaxial CaF[sub 2] overlayers on Si(111) studied by photon-stimulated desorption: Formation of surface [ital F] centers

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.579106· OSTI ID:7085093
; ; ;  [1]
  1. Department of Physics, University of California, Riverside, California 92521 (United States) Materials Science Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States)

The effects of radiation damage at the surfaces of CaF[sub 2] films grown on Si(111) substrates have been studied and the electronic transitions responsible for the formation of surface [ital F] centers have been identified by photon-stimulated desorption and soft x-ray photoelectron spectroscopy. The dominant desorption channel for F[sup +] ions is a direct Auger-stimulated process following an electronic transition from Ca 3[ital p] to 3[ital d]-derived states above the CaF[sub 2] conduction band minimum. At the Si 2[ital p] edge, there is an indirect x-ray induced electron-stimulated desorption process that contributes only slightly to the desorption of F[sup +]. The changes in the kinetic energy distributions of the desorbing F[sup +] ions as a function of film thickness are also discussed.

DOE Contract Number:
AC02-76CH00016; AC03-76SF00098
OSTI ID:
7085093
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Vol. 12:4; ISSN 0734-2101
Country of Publication:
United States
Language:
English