Sputter target
Patent
·
OSTI ID:7007535
The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy. 1 fig.
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- Patent Number(s):
- US 4209375; A
- Application Number:
- PPN: US 6-063008
- OSTI ID:
- 7007535
- Resource Relation:
- Patent File Date: 2 Aug 1979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
TARGETS
CHEMICAL COMPOSITION
VAPOR DEPOSITED COATINGS
FABRICATION
BRAZING
DESIGN
SPUTTERING
COATINGS
JOINING
WELDING
360101* - Metals & Alloys- Preparation & Fabrication
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture
TARGETS
CHEMICAL COMPOSITION
VAPOR DEPOSITED COATINGS
FABRICATION
BRAZING
DESIGN
SPUTTERING
COATINGS
JOINING
WELDING
360101* - Metals & Alloys- Preparation & Fabrication
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture