Nuclear track formation and track applications at GSI Darmstadt

Journal Article · Sat Jan 01 00:00:00 EST 1983 · Nucl. Sci. Appl.; (United States)

OSTI ID:6985313

Spohr, R

Heavy ion tracks in dielectric materials can be chemically ''amplified'' by an etching process that transforms the latent tracks into extremely fine channels. Etched track diameters start around 10 nm and increase linearly with the etching time. In contrast to all other techniques, a single particle is sufficient to create a developable damage. This opens the way for a single-particle structuring tool with a wide range of applications.

• Research Organization: Gesellschaft fur Schwerionenforschung GmbH Darmstadt
• OSTI ID: 6985313
• Journal Information: Nucl. Sci. Appl.; (United States), Vol. 1:6
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
DIELECTRIC MATERIALS
PARTICLE TRACKS
DIELECTRIC TRACK DETECTORS
ETCHING
AMPLIFICATION
DIMENSIONS
ION BEAMS
SINGLE-PARTICLE MODEL
TIME DEPENDENCE
USES
BEAMS
MATERIALS
MATHEMATICAL MODELS
MEASURING INSTRUMENTS
PARTICLE MODELS
RADIATION DETECTORS
SURFACE FINISHING
440101* - Radiation Instrumentation- General Detectors or Monitors & Radiometric Instruments