X-ray reflectivity measurements of vacuum deposited thin films

Conference · Wed Jan 01 00:00:00 EST 1992

OSTI ID:6948904

Chason, M ^[1]; Chason, E ^[2]

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1. Motorola, Inc., Schaumburg, IL (United States)
2. Sandia National Labs., Albuquerque, NM (United States)

X-ray reflectivity using energy dispersive X-ray detection, a nondestructive probe of surface roughness over the region of [approximately] 1--50 [Angstrom], has been used to investigate the characteristicsof vacuum deposited thin films. With a surface roughness sensitivity better than 1 [Angstrom] X-ray reflectivity is sensitive to interfaces between different materials for sample thicknesses up to approximately2000 [Angstrom] (depending on material density). We have investigated discrete Cr/Al deposits on quartz substrates and determined the surface roughness at the interfaces. We have also monitored the evolution ofthe Cr/Al interface following annealing. The experimental data is presented and discussed. The use of the technique for studying thin film deposits is addressed.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE; USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 6948904
• Report Number(s): SAND-92-2541C; CONF-930262-1; ON: DE93007579
• Resource Relation: Conference: Motorola 1993 winter advanced manufacturing technologies symposium, Phoenix, AZ (United States), 23-24 Feb 1993
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
INTERFACES
NONDESTRUCTIVE ANALYSIS
ROUGHNESS
MEASURING METHODS
THIN FILMS
LAYERS
REFLECTIVITY
VACUUM COATING
X RADIATION
CHEMICAL ANALYSIS
DEPOSITION
ELECTROMAGNETIC RADIATION
FILMS
IONIZING RADIATIONS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
RADIATIONS
SURFACE COATING
SURFACE PROPERTIES
420500* - Engineering- Materials Testing
400101 - Activation
Nuclear Reaction
Radiometric & Radiochemical Procedures