Measurement of atomic indium during metalorganic chemical vapor deposition

Journal Article · Thu Feb 01 00:00:00 EST 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.345644· OSTI ID:6935080

Hebner, G A; Killeen, K P ^[1]

---

1. Sandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185 (US)

Atomic indium, produced by the pyrolysis of trimethylindium (TMIn) during metalorganic chemical vapor deposition, has been directly observed using resonant fluorescence spectroscopy. The indium fluorescence signal is linear with TMIn flow rate at a susceptor temperature of 500 {degree}C above a small background threshold level. The threshold for the observation of an indium signal is 325 {degree}C. Addition of trimethylantimony (TMSb) at concentrations less than those required for normal InSb epitaxial growth results in quenching of the indium signal.

• OSTI ID: 6935080
• Journal Information: Journal of Applied Physics; (USA), Vol. 67:3; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

74 ATOMIC AND MOLECULAR PHYSICS
INDIUM
FLUORESCENCE
INDIUM ANTIMONIDES
CHEMICAL VAPOR DEPOSITION
INDIUM COMPOUNDS
PYROLYSIS
METHYL RADICALS
ATOMS
EPITAXY
RESONANCE
SPECTROSCOPY
ALKYL RADICALS
ANTIMONIDES
ANTIMONY COMPOUNDS
CHEMICAL COATING
CHEMICAL REACTIONS
DECOMPOSITION
DEPOSITION
ELEMENTS
LUMINESCENCE
METALS
PNICTIDES
RADICALS
SURFACE COATING
THERMOCHEMICAL PROCESSES
640302* - Atomic
Molecular & Chemical Physics- Atomic & Molecular Properties & Theory