Method for etching thin films of niboium and niobium-containing compounds for preparing superconductive circuits
An improved method of preparing thin film superconducting electrical circuits of niobium or niobium compounds is provided in which a thin film of the niobium or niobium compound is applied to a nonconductive substrate and covered with a layer of photosensitive material. The sensitive material is in turn covered with a circuit pattern exposed and developed to form a mask of the circuit in photoresistive material on the surface of the film. The unmasked excess niobium film is removed by contacting the substrate with an aqueous etching solution of nitric acid, sulfuric acid, and hydrogen fluoride, which will rapidly etch the niobium compound without undercutting the photoresist. A modification of the etching solution will permit thin films to be lifted from the substrate without further etching.
- DOE Contract Number:
- W-31-109-ENG-38
- Assignee:
- Dept. of Energy
- OSTI ID:
- 6927536
- Country of Publication:
- United States
- Language:
- English
Similar Records
Method for etching thin films of niobium and niobium-containing compounds for preparing superconductive circuits
Method for etching thin films of niobium and niobium-containing compounds for preparing superconductive circuits
Related Subjects
GENERAL PHYSICS
NIOBIUM
ETCHING
NIOBIUM COMPOUNDS
SUPERCONDUCTING FILMS
FABRICATION
DESIGN
HYDROFLUORIC ACID
NITRIC ACID
PHOTORESISTORS
SUBSTRATES
SULFURIC ACID
SUPERCONDUCTING DEVICES
ELECTRICAL EQUIPMENT
ELEMENTS
EQUIPMENT
FILMS
HYDROGEN COMPOUNDS
INORGANIC ACIDS
METALS
REFRACTORY METALS
RESISTORS
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
420201* - Engineering- Cryogenic Equipment & Devices