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Title: Optimization of transparent electrode for solar cell. Technical report, 15 September 1981-14 September 1982

Technical Report ·
OSTI ID:6875810

Electrically conductive, transparent films of fluorine doped tin oxide have been investigated during this contract. These films were grown by the chemical vapor deposition from tetramethyl tin (TMT) in the presence of air and a freon (bromotrifluoromethane). In order to find the optimal conditions for growing high quality films, the concentrations of the reactants were varied, and the resulting film quality was related to a figure of merit (electrical conductance/optical absorbance). This figure is independent of film thickness and increases as the quality of the film is improved. As a further test of quality the variations in the bulk conductivity were also investigated and shown to vary in the same way as the figure of merit. Film growth rates as a function of varying reactant concentrations were determined. Preliminary investigations of fluorine content by Auger spectroscopy were carried out. The surface morphology of the films was studied by scanning electron microscopy, and conditions for growing either smooth or rough films are reported.

Research Organization:
Harvard Univ., Cambridge, MA (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
6875810
Report Number(s):
SERI/PR-9318-2-T5; ON: DE83002804
Resource Relation:
Other Information: Portions of document are illegible
Country of Publication:
United States
Language:
English