Modeling of simulated photochemical smog with kinetic mechanisms. Volume 2. Chemk: a computer modeling scheme for chemical kinetics. Final report, July 1978-September 1979

Technical Report · Fri Feb 01 00:00:00 EST 1980

OSTI ID:6871398

Whitten, G Z; Hogo, H

Mechanisms that describe the formation of photochemical smog are developed using a computer modeling technique directed toward the simulation of data collected in two smog chambers: an indoor chamber and a dual outdoor chamber. Individual compounds for which specific experiments were simulated and mechanisms developed include the following: formaldehyde, acetaldehyde, ethylene, propylene, butane, and toluene. Volume 2 contains the user's manual and coding for a chemical kinetics computer program, CHEMK.

• Research Organization: Systems Applications, Inc., San Rafael, CA (USA)
• OSTI ID: 6871398
• Report Number(s): PB-80-181084
• Country of Publication: United States
• Language: English

Related Subjects

54 ENVIRONMENTAL SCIENCES
PHOTOCHEMICAL REACTIONS
COMPUTERIZED SIMULATION
MATHEMATICAL MODELS
ACETALDEHYDE
AIR POLLUTION
BUTANE
C CODES
DIFFERENTIAL EQUATIONS
ETHYLENE
FORMALDEHYDE
NITROGEN OXIDES
OXIDIZERS
OZONE
PROPYLENE
REACTION KINETICS
SMOG
TOLUENE
ALDEHYDES
ALKANES
ALKENES
AROMATICS
CHALCOGENIDES
CHEMICAL REACTIONS
COMPUTER CODES
EQUATIONS
HYDROCARBONS
KINETICS
NITROGEN COMPOUNDS
ORGANIC COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
POLLUTION
SIMULATION
500200* - Environment
Atmospheric- Chemicals Monitoring & Transport- (-1989)