Visible-laser photochemical etching of Cr, Mo, and W

Journal Article · Thu Jan 01 00:00:00 EST 1987 · J. Vac. Sci. Technol., B; (United States)

DOI:https://doi.org/10.1116/1.583916· OSTI ID:6815675

Rothschild, M; Sedlacek, J H.C.; Black, J G; Ehrlich, D J

Direct halogen etching of metal films by laser-induced photochemical and thermal processes at submicrometer resolution is described. The regimes in which each of the processes is prevalent are readily observed. In addition to direct definition of metal patterns, the etched metal films serve as durable resist layers for conventional etching processes. Cl/sub 2/ is photochemically dissociated at low laser power density levels, enabling direct-write etching of Cr, Mo, and W films on fragile substrates. NF/sub 3/-assisted etching is dominated by thermal reactions.

• Research Organization: Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173
• OSTI ID: 6815675
• Journal Information: J. Vac. Sci. Technol., B; (United States), Vol. 5:1
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHROMIUM
ETCHING
MOLYBDENUM
TUNGSTEN
LASER RADIATION
PHOTOCHEMISTRY
PHOTON COLLISIONS
CHEMISTRY
COLLISIONS
ELECTROMAGNETIC RADIATION
ELEMENTS
METALS
RADIATIONS
SURFACE FINISHING
TRANSITION ELEMENTS
360105* - Metals & Alloys- Corrosion & Erosion