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Title: Model for ion-implantation-induced improvements of photoferroelectric imaging in lead lanthanum zirconate titanate ceramics

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.92091· OSTI ID:6791617

Studies of photoferroelectric image storage in H-, He-, and, more recently, Ar-implanted /(PLZT) lead lanthanum zirconate titanate reveal that the photosensitivity can be significantly increased by ion implantation into the image storage surface. For example, the photosensitivity after implantation with 5 x 10/sup 14/ 500-keV Ar/cm/sup 2/ is increased by about three orders of magnitude over that of unimplanted PLZT. The increase in photosensitivity results from a decrease in dark conductivity and changes in the photoconductivity of the implanted layer. We present a phenomenological model which describes the photosensitivity enhancement obtained by ion implantation. This model takes into account both light- and ion- implantation-induced changes in conductivity and gives quantitative agreement with the measured changes in the coercive voltage with near-UV light intensity for ion-implantated PLZT.

Research Organization:
Sandia National Laboratories, Alberquerque, New Mexico, 87185
DOE Contract Number:
DE-AC04-76-DP00789
OSTI ID:
6791617
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 37:9
Country of Publication:
United States
Language:
English