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Title: Application of pulsed-uv laser Raman spectroscopy to chemical vapor deposition

Conference ·
OSTI ID:6766209

Raman detection limits obtained with a KrF laser excitation source were comparable to those obtained by laser-induced fluorescence and photofragment emission spectroscopy under chemical vapor deposition conditions.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6766209
Report Number(s):
SAND-81-0110; CONF-810613-4; TRN: 81-008955
Resource Relation:
Conference: Conference on lasers and electro-optics, Washington, DC, USA, 10 Jun 1981
Country of Publication:
United States
Language:
English

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Related Subjects

74 ATOMIC AND MOLECULAR PHYSICS
CHEMICAL VAPOR DEPOSITION
DIAGNOSTIC TECHNIQUES
RAMAN SPECTRA
DIAGNOSTIC USES
FLUORESCENCE
GAS LASERS
LASER RADIATION
LIMITING VALUES
ULTRAVIOLET RADIATION
CHEMICAL COATING
DEPOSITION
ELECTROMAGNETIC RADIATION
LASERS
LUMINESCENCE
RADIATIONS
SPECTRA
SURFACE COATING
USES
640304* - Atomic
Molecular & Chemical Physics- Collision Phenomena