5 to 160 keV continuous-wave x-ray spectral energy distribution and energy flux density measurements
- USAF Phillips Lab., Kirtland AFB, NM (United States). Microelectronics and Photonics Research Branch
In 1991, the USAF Phillips Laboratory Microelectronics and Photonics Research Branch installed a low energy x-ray facility (LEXR) for use in microelectronics radiation-effects analysis and research. Techniques developed for measuring the x-ray spectral energy distribution (differential intensity) from a tungsten-target bremsstrahlung x-ray source are reported. Spectra with end-point energies ranging from 20 to 160 keV were recorded. A separate effort to calibrate the dosimetry for the Phillips Laboratory low-energy x-ray facility established a need to know the spectral energy distributions at some point within the facility (previous calibration efforts had relies on spectra obtained from computer simulations). It was discovered that the primary discrepancy between the simulated and measured spectra was in the L- K-line data. The associated intensity (energy flux density) of the measured distributions was found to be up to 30% higher. Based on the measured distributions, predicted device responses were within 10% of the measured response as compared to about 30% accuracy obtained with simulated distributions.
- OSTI ID:
- 6762348
- Report Number(s):
- CONF-940726-; CODEN: IETNAE
- Journal Information:
- IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Vol. 41:6Pt1; Conference: 31. annual international nuclear and space radiation effects conference, Tucson, AZ (United States), 18-22 Jul 1994; ISSN 0018-9499
- Country of Publication:
- United States
- Language:
- English
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MICROELECTRONIC CIRCUITS
PHYSICAL RADIATION EFFECTS
TEST FACILITIES
X-RAY SOURCES
ENERGY SPECTRA
COMPARATIVE EVALUATIONS
EXPERIMENTAL DATA
MEASURING METHODS
X-RAY SPECTRA
DATA
ELECTRONIC CIRCUITS
EQUIPMENT
EVALUATION
INFORMATION
NUMERICAL DATA
RADIATION EFFECTS
RADIATION SOURCES
SPECTRA
X-RAY EQUIPMENT
440200* - Radiation Effects on Instrument Components
Instruments
or Electronic Systems