Hydrogen absorption characteristics of amorphous LaNi[sub 5. 0] films prepared by reactive sputtering

Journal Article · Fri Jan 01 00:00:00 EST 1993 · Chemistry of Materials; (United States)

DOI:https://doi.org/10.1021/cm00025a003· OSTI ID:6722350

Sakaguchi, H; Tsujimoto, T; Adachi, Ginya ^[1]

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1. Osaka University, Suita (Japan)

Amorphous LaNi[sub 5] thin films are expected to be one of the promising materials for use in hydrogen separation and battery electrodes, because the durability of the films is great in regard to the hydrogen absorption-desorption cycling process and the films have excellent resistance to harmful impurities in the hydrogen gas in comparison with the crystalline bulk material. An amorphous LaNi[sub 5.0] film having high hydrogen density and low hydrogen-induced stress was obtained by means of a reactive sputtering method using an Ar-H[sub 2] gas mixture. Pressure-composition isotherms show that the amount of hydrogen (H/LaNi[sub 5.0]) taken up by a formula weight of LaNi[sub 5.0] is about 1.5 times larger for the reactive sputtered film than for the conventional sputtered film prepared by using Ar gas. 18 refs., 1 fig, 1 tabs.

• OSTI ID: 6722350
• Journal Information: Chemistry of Materials; (United States), Vol. 5:1; ISSN 0897-4756
• Country of Publication: United States
• Language: English

Related Subjects

25 ENERGY STORAGE
08 HYDROGEN
HYDROGEN
ABSORPTION
LANTHANUM ALLOYS
SORPTIVE PROPERTIES
NICKEL ALLOYS
ELECTRODES
FILMS
SPUTTERING
ALLOYS
ELEMENTS
NONMETALS
RARE EARTH ALLOYS
SORPTION
SURFACE PROPERTIES
250903* - Energy Storage- Batteries- Materials
Components
& Auxiliaries
080201 - Hydrogen- Chemisorption Storage