Plasma ion implantation technology at Hughes Research Laboratories

Journal Article · Tue Mar 01 00:00:00 EST 1994 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)

DOI:https://doi.org/10.1116/1.587358· OSTI ID:6697789

Matossian, J N ^[1]

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1. Plasma Physics Laboratory, Hughes Research Laboratories, Malibu, California 90265 (United States)

The plasma ion implantation (PII) project at Hughes Research Laboratories (HRL) has as its main objective the evaluation and application of PII technology to improve the tribological properties of metal and nonmetal materials used in aerospace, defense, and commercial applications. The HRL PII facility consists of a 4-ft-diam[times]8-ft-long vacuum chamber capable of implanting objects weighing up to 7000 lbs, and a high-power (100-kW), high-voltage (100-kV) pulse modulator to provide voltage pulses for implantation. Advanced plasma sources have been developed to produce atomic, as well as molecular, nitrogen and oxygen ions, and PII processes have been developed to treat metal and nonmetal materials. The HRL PII facility has been operational since 1989 and has been used for prototype demonstrations of PII technology to achieve (1) a 2--3[times] improved wear life of Co/WC drill bits used for printed-wiring-board fabrication, (2) an 8[times] reduced wear rate for TiN-coated cutting tools, and (3) a 2[times] increased surface hardness for a 7000-lb polymer object, 3 ft by 5 ft by 1 ft.

• OSTI ID: 6697789
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Vol. 12:2; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

07 ISOTOPES AND RADIATION SOURCES
CUTTING TOOLS
SURFACE HARDENING
DRILL BITS
ION IMPLANTATION
COMMERCIALIZATION
POLYMERS
SURFACE TREATMENTS
COBALT
NITROGEN IONS
OXYGEN IONS
TITANIUM NITRIDES
TUNGSTEN CARBIDES
VACUUM SYSTEMS
CARBIDES
CARBON COMPOUNDS
CHARGED PARTICLES
DRILLING EQUIPMENT
ELEMENTS
EQUIPMENT
HARDENING
IONS
METALS
NITRIDES
NITROGEN COMPOUNDS
PNICTIDES
REFRACTORY METAL COMPOUNDS
TITANIUM COMPOUNDS
TOOLS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN COMPOUNDS
070205* - Radiation Sources- Industrial Applications
Radiation Processing- (1987-)