Site selectivity in the reaction of Si(111)-(7 times 7) with Si sub 2 H sub 6
Journal Article
·
· Journal of Physical Chemistry; (USA)
- T. J. Watson Research Center, Yorktown Heights, NY (USA)
We find that the reaction of disilane with the Si(111)-(7{times}7) surface shows strong site selectivity. The reaction involves the fission of the Si-Si bond of Si{sub 2}H{sub 6} even at low temperatures and occurs preferentially at rest-atom sites of the 7{times}7 surface. The reaction of the products of the thermal dissociation of the surface-bound SiH{sub x} groups with surface dangling-bond sites is also site selective. We propose mechanisms to explain the above observations.
- OSTI ID:
- 6637837
- Journal Information:
- Journal of Physical Chemistry; (USA), Vol. 94:6; ISSN 0022-3654
- Country of Publication:
- United States
- Language:
- English
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+4 more
Related Subjects
36 MATERIALS SCIENCE
SEMICONDUCTOR MATERIALS
CHEMICAL REACTIONS
SURFACE PROPERTIES
DATA ANALYSIS
EXPERIMENTAL DATA
MEASURING INSTRUMENTS
MEASURING METHODS
SILANES
SILICON
DATA
ELEMENTS
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
MATERIALS
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
SEMIMETALS
SILICON COMPOUNDS
360603* - Materials- Properties
SEMICONDUCTOR MATERIALS
CHEMICAL REACTIONS
SURFACE PROPERTIES
DATA ANALYSIS
EXPERIMENTAL DATA
MEASURING INSTRUMENTS
MEASURING METHODS
SILANES
SILICON
DATA
ELEMENTS
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
MATERIALS
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
SEMIMETALS
SILICON COMPOUNDS
360603* - Materials- Properties