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Title: Site selectivity in the reaction of Si(111)-(7 times 7) with Si sub 2 H sub 6

Journal Article · · Journal of Physical Chemistry; (USA)
DOI:https://doi.org/10.1021/j100369a010· OSTI ID:6637837
;  [1]
  1. T. J. Watson Research Center, Yorktown Heights, NY (USA)

We find that the reaction of disilane with the Si(111)-(7{times}7) surface shows strong site selectivity. The reaction involves the fission of the Si-Si bond of Si{sub 2}H{sub 6} even at low temperatures and occurs preferentially at rest-atom sites of the 7{times}7 surface. The reaction of the products of the thermal dissociation of the surface-bound SiH{sub x} groups with surface dangling-bond sites is also site selective. We propose mechanisms to explain the above observations.

OSTI ID:
6637837
Journal Information:
Journal of Physical Chemistry; (USA), Vol. 94:6; ISSN 0022-3654
Country of Publication:
United States
Language:
English