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Title: Thermal oxidation of III-V compound semiconductors

Technical Report ·
OSTI ID:6550439

Thermal oxidation of III-V compound semiconductors has been studied in the temperature range of 300/degree/C to 600/degree/C. Two members of this class of materials, namely InP and GaAs, were the object of the experimental work carried out here. The main analytical tools used were transmission electron microscopy (TEM) and secondary ion mass spectroscopy (SIMS). TEM was employed to access microstructural changes and SIMS to access the composition redistribution that takes place as a consequence of the oxidation reaction. Below 400/degree/C oxidation of both materials led to the formation of amorphous scales, which consisted of a mixture of gallium and arsenic oxides in the case of GaAs, and indium phosphate and oxide in the case of InP. The oxidation kinetics of InP was found to be slower than that of GaAs. In the high temperature regime, i.e., above 400/degree/C, the oxidation of both materials resulted in crystalline products. Precipitation of the group V element at the scale/semiconductor interface took place during oxidation. At the GaAs/Ga/sub 2/O/sub 3/interface, As precipitates were formed with a truncated square pyramid shape bound by /l brace/111/r brace//sub GaAs/ planes. The precipitates found at the InPO/sub 4//InP interface were either a phosphorus rich phase or red phosphorus. Strong vaporization under the electron beam prohibited a more accurate determination. The morphology of those precipitates were very similar to the As ones in GaAs. 83 refs., 48 figs., 6 tabs.

Research Organization:
Lawrence Berkeley Lab., CA (USA)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6550439
Report Number(s):
LBL-26337; ON: DE89007127
Resource Relation:
Other Information: Thesis (Ph.D.). Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English