Visible-laser etching of refractory metals by surface modification
A two-step laser etching technique for Mo and W films is described. In the first step, the laser modifies the chemical composition of the metal surface; in the second, deep etching of the pre-exposed areas is by broad-area heating in a reactive ambient. The surface modification takes place in the presence of Cl/sub 2/, which etches the native-metal oxide and replaces it with a more volatile metal halide. Deep etching is performed with NF/sub 3/. Since the native oxide is resistant toward etching with NF/sub 3/, the second step is selective with respect to the laser-halogenated area and is, in effect, a chemical amplification of the surface modification. Well-delineated, high-contrast patterns are obtained with this method.
- Research Organization:
- Massachusetts Institute of Technology Lincoln Laboratory, Lexington, Massachusetts 02173
- OSTI ID:
- 6200237
- Journal Information:
- J. Vac. Sci. Technol., B; (United States), Vol. 5:5
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CHLORINE
COLLISIONS
MOLYBDENUM
ETCHING
LASER-RADIATION HEATING
MOLECULE COLLISIONS
NITROGEN FLUORIDES
TUNGSTEN
CHEMICAL COMPOSITION
ELEMENTS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
HEATING
METALS
NITROGEN COMPOUNDS
NONMETALS
PLASMA HEATING
SURFACE FINISHING
TRANSITION ELEMENTS
360101* - Metals & Alloys- Preparation & Fabrication