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Title: Power and magnetic field-induced microwave absorption in Tl-based high T sub c superconducting films

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104670· OSTI ID:6193958
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  1. University of California at Berkeley, Berkeley, California 94720 (US)
  2. Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (US)
  3. Argonne National Laboratory, Argonne, Illinois 60439 (US)
  4. Bergische Universitaet Wuppertal, Wuppertal, Germany (DE)

The increase in the microwave surface resistance {ital R}{sub {ital s}} of high {ital T}{sub {ital c}} superconductors at elevated microwave power levels is reported for both oriented and unoriented Tl-based films as a function of rf magnetic field at 820 MHz and 18 GHz. The application of dc magnetic fields produces qualitatively similar increases in {ital R}{sub {ital s}} and in the surface reactance {ital X}{sub {ital s}}. The increase in {ital R}{sub {ital s}} with dc field is shown to arise from simple decoupling of grains by intergranular magnetic flux. The increase in {ital R}{sub {ital s}} with microwave power, on the other hand, is a consequence of hysteretic intergranular processes.

DOE Contract Number:
AC03-76SF00098
OSTI ID:
6193958
Journal Information:
Applied Physics Letters; (USA), Vol. 58:3; ISSN 0003-6951
Country of Publication:
United States
Language:
English