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Title: Effect of diborane profile on the photovoltaic performance of A-Si:H solar cells prepared by glow discharge of disilane

Conference · · Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
OSTI ID:6070978

Extra high speed preparation of Al/nip/SnO/sub 2// ITO/Glass solar cells from disilane is presented. The effect of graded boron-doping during the i-layer deposition has been investigated on the performance of amorphous Si:H solar cells. It is found that the characteristics of cells strongly depend on the graded doping profile of diborane and the high efficiency of 8.05 % (AMl, 0.25 cm/sup 2/) was obtained with the linear graded doping profile at the deposition rate of 17 A/s. Moreover, in order to confirm the graded boron-doping effect, the theoretical analysis was carried out.

Research Organization:
Tokyo Institute of Technology, Ohokayama, Meguro-ku, Tokyo
OSTI ID:
6070978
Report Number(s):
CONF-840561-
Journal Information:
Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States), Conference: 17. IEEE photovoltaic specialists conference, Orlando, FL, USA, 1 May 1984
Country of Publication:
United States
Language:
English