An electron undulating ring for VLSI lithography
Abstract
The development of the ETL storage ring ''TERAS'' as an undulating ring has been continued to achieve a wide area exposure of synchrotron radiation (SR) in VLSI lithography. Stable vertical and horizontal undulating motions of stored beams are demonstrated around a horizontal design orbit of TERAS, using two small steering magnets of which one is used for vertical undulating and another for horizontal one. Each steering magnet is inserted into one of the periodic configulation of guide field elements. As one of useful applications of undulaing electron beams, a vertically wide exposure of SR has been demonstrated in the SR lithography. The maximum vertical deviation from the design orbit nCcurs near the steering magnet. The maximum vertical tilt angle of the undulating beam near the nodes is about + or - 2mrad for a steering magnetic field of 50 gauss. Another proposal is for hith-intensity, uniform and wide exposure of SR from a wiggler installed in TERAS, using vertical and horizontal undulating motions of stored beams. A 1.4 m long permanent magnet wiggler has been installed for this purpose in this April.
- Authors:
- Publication Date:
- Research Org.:
- Electrotechnical Laboratory, Sakura, Niihari, Ibaraki
- OSTI Identifier:
- 6061726
- Report Number(s):
- CONF-850504-
Journal ID: CODEN: IETNA; TRN: 86-011486
- Resource Type:
- Conference
- Journal Name:
- IEEE Trans. Nucl. Sci.; (United States)
- Additional Journal Information:
- Journal Volume: NS-32:5; Conference: Particle accelerator conference, Vancouver, Canada, 13 May 1985
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 43 PARTICLE ACCELERATORS; INTEGRATED CIRCUITS; FABRICATION; STORAGE RINGS; SYNCHROTRON RADIATION; BEAM FOCUSING MAGNETS; ELECTRON BEAMS; SYNCHROTRON RADIATION SOURCES; WIGGLER MAGNETS; BEAMS; BREMSSTRAHLUNG; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELECTROMAGNETS; ELECTRONIC CIRCUITS; EQUIPMENT; LEPTON BEAMS; MAGNETS; MICROELECTRONIC CIRCUITS; PARTICLE BEAMS; RADIATION SOURCES; RADIATIONS; 430400* - Particle Accelerators- Storage Rings
Citation Formats
Tomimasu, T, Mikado, T, Noguchi, T, Sugiyama, S, and Yamazaki, T. An electron undulating ring for VLSI lithography. United States: N. p., 1985.
Web.
Tomimasu, T, Mikado, T, Noguchi, T, Sugiyama, S, & Yamazaki, T. An electron undulating ring for VLSI lithography. United States.
Tomimasu, T, Mikado, T, Noguchi, T, Sugiyama, S, and Yamazaki, T. 1985.
"An electron undulating ring for VLSI lithography". United States.
@article{osti_6061726,
title = {An electron undulating ring for VLSI lithography},
author = {Tomimasu, T and Mikado, T and Noguchi, T and Sugiyama, S and Yamazaki, T},
abstractNote = {The development of the ETL storage ring ''TERAS'' as an undulating ring has been continued to achieve a wide area exposure of synchrotron radiation (SR) in VLSI lithography. Stable vertical and horizontal undulating motions of stored beams are demonstrated around a horizontal design orbit of TERAS, using two small steering magnets of which one is used for vertical undulating and another for horizontal one. Each steering magnet is inserted into one of the periodic configulation of guide field elements. As one of useful applications of undulaing electron beams, a vertically wide exposure of SR has been demonstrated in the SR lithography. The maximum vertical deviation from the design orbit nCcurs near the steering magnet. The maximum vertical tilt angle of the undulating beam near the nodes is about + or - 2mrad for a steering magnetic field of 50 gauss. Another proposal is for hith-intensity, uniform and wide exposure of SR from a wiggler installed in TERAS, using vertical and horizontal undulating motions of stored beams. A 1.4 m long permanent magnet wiggler has been installed for this purpose in this April.},
doi = {},
url = {https://www.osti.gov/biblio/6061726},
journal = {IEEE Trans. Nucl. Sci.; (United States)},
number = ,
volume = NS-32:5,
place = {United States},
year = {Tue Oct 01 00:00:00 EDT 1985},
month = {Tue Oct 01 00:00:00 EDT 1985}
}