Determination of argon in sputtered silicon films by energy-dispersive x-ray fluorescence spectrometry
Journal Article
·
· Anal. Chem.; (United States)
Hydrogenated amorphous silicon can be prepared by glow discharge decomposition of silane or by reactive sputtering in an argon + hydrogen plasma. The sputtered films contain some percentage of argon incorporated in them and its role in determining the physical properties of these materials is of interest. This paper describes energy-dispersive x-ray fluorescence (EDXRF) methods which were developed to characterize these kinds of sputtered films. The theoretical principles and the x-ray line intensity correction algorithms for thin-film measurements are reviewed. The advantages of the EDXRF method and the applicability of this technique for other film systems are discussed.
- Research Organization:
- Exxon Research and Engineering Co., Linden, NJ
- OSTI ID:
- 5975109
- Journal Information:
- Anal. Chem.; (United States), Vol. 53:12
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
ARGON
FLUORESCENCE SPECTROSCOPY
SILANES
CHEMICAL ANALYSIS
SILICON
EXPERIMENTAL DATA
FILMS
QUANTITATIVE CHEMICAL ANALYSIS
X RADIATION
X-RAY SPECTROSCOPY
DATA
ELECTROMAGNETIC RADIATION
ELEMENTS
EMISSION SPECTROSCOPY
FLUIDS
GASES
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
IONIZING RADIATIONS
NONMETALS
NUMERICAL DATA
RADIATIONS
RARE GASES
SEMIMETALS
SILICON COMPOUNDS
SPECTROSCOPY
400104* - Spectral Procedures- (-1987)
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
ARGON
FLUORESCENCE SPECTROSCOPY
SILANES
CHEMICAL ANALYSIS
SILICON
EXPERIMENTAL DATA
FILMS
QUANTITATIVE CHEMICAL ANALYSIS
X RADIATION
X-RAY SPECTROSCOPY
DATA
ELECTROMAGNETIC RADIATION
ELEMENTS
EMISSION SPECTROSCOPY
FLUIDS
GASES
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
IONIZING RADIATIONS
NONMETALS
NUMERICAL DATA
RADIATIONS
RARE GASES
SEMIMETALS
SILICON COMPOUNDS
SPECTROSCOPY
400104* - Spectral Procedures- (-1987)