Stress reduction in ion beam sputtered mixed oxide films

Journal Article · Sat Jul 15 00:00:00 EDT 1989 · Appl. Opt.; (United States)

DOI:https://doi.org/10.1364/AO.28.002800· OSTI ID:5952635

Pond, B J; DeBar, J I; Carniglia, C K; Raj, T

Thin films deposited by ion beam sputtering typically have a high compressive stress. This paper demonstrates that this stress can be reduced by cosputtering two materials. Thin film mixtures of zirconia (ZrO/sub 2/) and silica (SiO/sub 2/) were prepared with a range of compositions using ion beam sputtering. The refractive index was found to vary almost linearly with composition. The large stress observed in zirconia films was found to be reduced significantly by the addition of silica.

• Research Organization: Martin Marietta Astronautics Group, Laser Systems Technology, P.O. Box 9316, International Airport Albuquerque, New Mexico 87119(US)
• OSTI ID: 5952635
• Journal Information: Appl. Opt.; (United States), Vol. 28:14
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COATINGS
DEPOSITION
STRESSES
SILICA
OPTICAL PROPERTIES
ZIRCONIUM OXIDES
CHEMICAL COMPOSITION
ION BEAMS
SPUTTERING
BEAMS
CHALCOGENIDES
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SILICON COMPOUNDS
SILICON OXIDES
TRANSITION ELEMENT COMPOUNDS
ZIRCONIUM COMPOUNDS
360204* - Ceramics
Cermets
& Refractories- Physical Properties
360203 - Ceramics
Cermets
& Refractories- Mechanical Properties