Oxynitride glass production procedure
Patent
·
OSTI ID:5928877
This patent describes the invention of a process for the preparation of high quality oxynitride glasses without resorting to high pressures. Nitrogen-containing compounds such as Si{sub 3}N{sub 4} are first encapsulated in a low melting temperature glass. Particles of the encapsulated nitrogen-containing compound are mixed with other oxide glass-formers and melted in an atmosphere of flowing nitrogen and in the presence of buffering gas to form the oxynitride glass. Glasses containing up to 15 at % nitrogen have been prepared by this method.
- Assignee:
- US DOE, Washington, DC (USA)
- Patent Number(s):
- US 5006142; A
- Application Number:
- PPN: US 7-500352
- OSTI ID:
- 5928877
- Resource Relation:
- Patent File Date: 28 Mar 1990
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
GLASS
CHEMICAL PREPARATION
SILICON NITRIDES
GAS FLOW
MECHANICAL PROPERTIES
NITROGEN
OPTIMIZATION
OXIDES
PHASE STUDIES
THERMAL EXPANSION
CHALCOGENIDES
ELEMENTS
EXPANSION
FLUID FLOW
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
OXYGEN COMPOUNDS
PNICTIDES
SILICON COMPOUNDS
SYNTHESIS
360601* - Other Materials- Preparation & Manufacture
400201 - Chemical & Physicochemical Properties
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
GLASS
CHEMICAL PREPARATION
SILICON NITRIDES
GAS FLOW
MECHANICAL PROPERTIES
NITROGEN
OPTIMIZATION
OXIDES
PHASE STUDIES
THERMAL EXPANSION
CHALCOGENIDES
ELEMENTS
EXPANSION
FLUID FLOW
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
OXYGEN COMPOUNDS
PNICTIDES
SILICON COMPOUNDS
SYNTHESIS
360601* - Other Materials- Preparation & Manufacture
400201 - Chemical & Physicochemical Properties