Repair of high performance multilayer coatings
- Brigham Young Univ., Provo, UT (United States). Dept. of Physics and Astronomy
- Lawrence Livermore National Lab., CA (United States)
- Vernon Applied Physics, Torrance, CA (United States)
- Physikalisch-Technische Bundesanstalt, Berlin (Germany). VUV Radiometric Lab.
Fabrication and environmental damage issues may require that the multilayer x-ray reflection coatings used in soft x-ray projection lithography be replaced or repaired. Two repair strategies were investigated. The first was to overcoat defective multilayers with a new multilayer. The feasibility of this approach was demonstrated by depositing high reflectivity (61% at 130 {Angstrom}) molybdenum silicon (Mo/Si) multilayers onto fused silica figured optics that had already been coated with a Mo/Si multilayer. Because some types of damage mechanisms and fabrication errors are not repairable by this method, a second method of repair was investigated. The multilayer was stripped from the optical substrate by etching a release layer which was deposited onto the substrate beneath the multilayer. The release layer consisted of a 1000 {Angstrom} aluminum film deposited by ion beam sputtering or by electron beam evaporation, with a 300 {Angstrom} SiO{sub 2} protective overcoat. The substrates were superpolished zerodur optical flats. The normal incidence x-ray reflectivity of multilayers deposited on these aluminized substrates was degraded, presumably due to the roughness of the aluminum films. Multilayers, and the underlying release layers, have been removed without damaging the substrates.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 5921722
- Report Number(s):
- UCRL-JC-108297; CONF-9107115-67; ON: DE92007339
- Resource Relation:
- Conference: Society of Photo-Optical Instrumentation Engineers (SPIE) meeting, San Diego, CA (United States), 21-26 Jul 1991
- Country of Publication:
- United States
- Language:
- English
Similar Records
EUVL Mask Blank Repair
Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography
Related Subjects
42 ENGINEERING
LAYERS
REPAIR
MOLYBDENUM
SURFACE COATING
SILICON
ALUMINIUM
DEPOSITION
FILMS
REFLECTIVITY
SURFACE PROPERTIES
THICKNESS
X RADIATION
DIMENSIONS
ELECTROMAGNETIC RADIATION
ELEMENTS
IONIZING RADIATIONS
METALS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
RADIATIONS
SEMIMETALS
TRANSITION ELEMENTS
360101* - Metals & Alloys- Preparation & Fabrication
426000 - Engineering- Components
Electron Devices & Circuits- (1990-)