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Title: Reproducible technique for fabrication of thin films of high transition temperature superconductors

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98513· OSTI ID:5829086

We report on a new process to make films of Y/sub 1/Ba/sub 2/Cu/sub 3/O/sub 7/ using coevaporation of Y, Cu, and BaF/sub 2/ on SrTiO/sub 3/ substrates. The films have high transition temperatures (up to 91 K for a full resistive transition), high critical current densities (10/sup 6/ A/cm/sup 2/ at 81 K), and a reduced sensitivity to fabrication and environmental conditions. Because of the lower reactivity of the films, we have been able to pattern them in both the pre-annealed and post-annealed states using conventional positive photoresist technology.

Research Organization:
Room 4D-335, AT and T Bell Laboratories, Holmdel, New Jersey 07733
OSTI ID:
5829086
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 51:21
Country of Publication:
United States
Language:
English