Characterization of OMVPE-grown AlGaInN heterostructures
Book
·
OSTI ID:581092
- Xerox Palo Alto Research Center, CA (United States). Electronic Materials Lab.
- Hewlett-Packard Optoelectronics Div., San Jose, CA (United States); and others
The authors report on the OMVPE growth and characterization of AlGaInN and its heterostructures, including measurements of electrical properties (Hall), optical properties (photo- and cathodo-luminescence), structural characteristics (x-ray diffraction and TEM); and also the emission of InGaN/AlGaN heterostructures subject to optical and electrical pumping.
- OSTI ID:
- 581092
- Report Number(s):
- CONF-961202-; ISBN 1-55899-353-3; TRN: IM9807%%169
- Resource Relation:
- Conference: 1996 Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 2-6 Dec 1996; Other Information: PBD: 1997; Related Information: Is Part Of III-V nitrides; Ponce, F.A. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Moustakas, T.D. [ed.] [Boston Univ., MA (United States)]; Akasaki, I. [ed.] [Meijo Univ., Nagoya (Japan)]; Monemar, B.A. [ed.] [Linkoeping Univ. (Sweden)]; PB: 1278 p.; Materials Research Society symposium proceedings, Volume 449
- Country of Publication:
- United States
- Language:
- English
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