skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: In situ atomic force microscopy of laser-conditioned and laser- damaged HfO sub 2 /saw sub 2 dielectric mirror coatings

Abstract

Atomic force microscopy was used to determine in situ the nm-scale morphological changes that occur on dielectric optical coatings as a result of laser illumination. Of particular interest is a process called laser conditioning in which the damage threshold of the films is increased by a factor of 2 to 3 when the film is first illuminated at fluences below the damage threshold. The optical coating studied was a highly reflective dielectric multilayer mirror (HR) consisting of many alternating quarter-wave layers of HfO{sub 2} and SiO{sub 2} at 1.06 {mu}m. The top layer was a {lambda}/2 SiO{sub 2} overcoat. Laser beam specifications were: 1.06-{mu}m wavelength, 8- to 10-ns pulsewidth. Laser beam spot sizes ranging from 85 {mu}m to 1.4 mm in diameter. The maximum scan range of the AFM was 80 {mu}m. A survey of the as-deposited surface shows mostly hillocks approximately 200 nm in diameter and 10 nm in height. The predominant surface irregularity is {mu}m-scale domes associated with well known nodule defects. Laser illumination causes nodule defects to be easily ejected from the coating surface. Further damage may propagate from the resulting craters. These nodule defects therefore determine the damage threshold of the film. Using the AFM wemore » have shown that for illumination at fluences below the nodule ejection threshold we observe a decrease in the surface roughness of the nodule defects and hillock structure of the as-deposited film. The subtle changes in these surface features may be an indication that the film is being mechanically stabilized, thus providing the observed conditioning effect.« less

Authors:
; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (United States)
Sponsoring Org.:
USDOE; USDOE, Washington, DC (United States)
OSTI Identifier:
5689477
Report Number(s):
UCRL-JC-108274; CONF-911064-7
ON: DE92008079
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: SPIE International Society for Optical Engineering meeting, Boulder, CO (United States), 23-25 Oct 1991
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 36 MATERIALS SCIENCE; LASER MIRRORS; PHYSICAL RADIATION EFFECTS; REFLECTIVE COATINGS; LASER RADIATION; DAMAGE; HAFNIUM OXIDES; MICROSCOPY; NOVA FACILITY; SILICON OXIDES; CHALCOGENIDES; COATINGS; ELECTROMAGNETIC RADIATION; HAFNIUM COMPOUNDS; MIRRORS; OXIDES; OXYGEN COMPOUNDS; RADIATION EFFECTS; RADIATIONS; REFRACTORY METAL COMPOUNDS; SILICON COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; 700410* - Specific Fusion Devices & Experiments- (1992-); 360206 - Ceramics, Cermets, & Refractories- Radiation Effects

Citation Formats

Staggs, M C, Balooch, M, Kozlowski, M R, and Siekhaus, W J. In situ atomic force microscopy of laser-conditioned and laser- damaged HfO sub 2 /saw sub 2 dielectric mirror coatings. United States: N. p., 1991. Web.
Staggs, M C, Balooch, M, Kozlowski, M R, & Siekhaus, W J. In situ atomic force microscopy of laser-conditioned and laser- damaged HfO sub 2 /saw sub 2 dielectric mirror coatings. United States.
Staggs, M C, Balooch, M, Kozlowski, M R, and Siekhaus, W J. 1991. "In situ atomic force microscopy of laser-conditioned and laser- damaged HfO sub 2 /saw sub 2 dielectric mirror coatings". United States.
@article{osti_5689477,
title = {In situ atomic force microscopy of laser-conditioned and laser- damaged HfO sub 2 /saw sub 2 dielectric mirror coatings},
author = {Staggs, M C and Balooch, M and Kozlowski, M R and Siekhaus, W J},
abstractNote = {Atomic force microscopy was used to determine in situ the nm-scale morphological changes that occur on dielectric optical coatings as a result of laser illumination. Of particular interest is a process called laser conditioning in which the damage threshold of the films is increased by a factor of 2 to 3 when the film is first illuminated at fluences below the damage threshold. The optical coating studied was a highly reflective dielectric multilayer mirror (HR) consisting of many alternating quarter-wave layers of HfO{sub 2} and SiO{sub 2} at 1.06 {mu}m. The top layer was a {lambda}/2 SiO{sub 2} overcoat. Laser beam specifications were: 1.06-{mu}m wavelength, 8- to 10-ns pulsewidth. Laser beam spot sizes ranging from 85 {mu}m to 1.4 mm in diameter. The maximum scan range of the AFM was 80 {mu}m. A survey of the as-deposited surface shows mostly hillocks approximately 200 nm in diameter and 10 nm in height. The predominant surface irregularity is {mu}m-scale domes associated with well known nodule defects. Laser illumination causes nodule defects to be easily ejected from the coating surface. Further damage may propagate from the resulting craters. These nodule defects therefore determine the damage threshold of the film. Using the AFM we have shown that for illumination at fluences below the nodule ejection threshold we observe a decrease in the surface roughness of the nodule defects and hillock structure of the as-deposited film. The subtle changes in these surface features may be an indication that the film is being mechanically stabilized, thus providing the observed conditioning effect.},
doi = {},
url = {https://www.osti.gov/biblio/5689477}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 07 00:00:00 EST 1991},
month = {Mon Jan 07 00:00:00 EST 1991}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

Save / Share: