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Title: Solid-state NMR studies of the reactions of silica surfaces with polyfunctional chloromethylsilanes and ethoxymethylsilanes

Journal Article · · J. Am. Chem. Soc.; (United States)
DOI:https://doi.org/10.1021/ja00350a003· OSTI ID:5614776

The silylation of silica (Si) surfaces by dimethyldichlorosilane, methyltrichlorosilane, dimethyldiethoxysilane, and methyltriethoxysilane has been studied by solid-state /sup 29/Si and /sup 13/C NMR, by use of cross polarization (CP) and magic-angle spinning (MAS). An earlier formalism for the quantitative analysis of the NRM data has been extended for use with polyfunctional silyating agents and applied in detail to dimethyldichlorosilane reactions. Silylation with ethoxysilane reagents is less amenable to quantitative interpretation but appears to parallel closely the behavior of analogous chlorosilane reagents. With ethoxysilane reagents /sup 13/C NMR is found to be quite useful, especially for determining the fate of ethoxy groups. In all of the cases studied, the products are characterized primarily by single silane-to-surface attachments of each silane silicon atom. The presence of absorbed water is found to play an important role in the course and rate of the silylation reactions, especially those employing ethoxysilane reagents. The NMR data are used to address the question of horizontal and vertical polymerization within the silane phase on the silica surface.

Research Organization:
Colorado State Univ., Fort Collins
DOE Contract Number:
AS20-81LC10652
OSTI ID:
5614776
Journal Information:
J. Am. Chem. Soc.; (United States), Vol. 105:12
Country of Publication:
United States
Language:
English