Status of the GEC RF Reference Cell/laser diagnostics of plasma etching discharges
The Gaseous Electronics Conference (GEC) RF Reference Cell was developed to enhance studies of radiofrequency (rf) discharge systems analogous to those used to fabricate microelectronic devices. The Reference Cell concept includes both a standard discharge-chamber design and a set of diagnostic tools that can be used to verify that different Cells behave similarly. Voltage and current measurements in Reference Cells in the United States show that, with proper care, plasmas that behave in a similar manner can be generated in different Cells. The versatility of the Reference Cell is illustrated by results on the use of planar laser-induced fluorescence imaging to obtain two-dimensional spatial profiles of SO{sub 2} in an SF{sub 6}/O{sub 2} rf discharge. 4 refs., 5 figs.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (USA)
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (USA)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 5552973
- Report Number(s):
- SAND-91-1113C; CONF-9106212-1; ON: DE91014108
- Resource Relation:
- Conference: International seminar on reactive plasmas, Nagoya (Japan), 17-19 Jun 1991
- Country of Publication:
- United States
- Language:
- English
Similar Records
Comparison of etch performance in the GEC Reference Cell with a commercial etcher
Measurements and analysis of the equivalent circuit of the GEC RF Reference Cell. [GEC (Gaseous Electronics Conference); RF (radio-frequency)]
Related Subjects
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
SULFUR DIOXIDE
FLUORESCENCE SPECTROSCOPY
ELECTRIC DISCHARGES
ETCHING
LASERS
PLASMA DIAGNOSTICS
RF SYSTEMS
SPATIAL RESOLUTION
SULFUR FLUORIDES
CHALCOGENIDES
EMISSION SPECTROSCOPY
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
RESOLUTION
SPECTROSCOPY
SULFUR COMPOUNDS
SULFUR OXIDES
SURFACE FINISHING
400102* - Chemical & Spectral Procedures