Effects of nitrogen pulsing on sputter-deposited beryllium films
Abstract
Beryllium films have been used as a heat sink'' layer between the reflective coating of a mirror and its glass substrate to improve the mirror's radiation resistance to prompt deposition of x-rays. Under x-ray irradiation, the beryllium heat sink'' layer is subjected to tensile stresses caused by differences in thermal expansion coefficients. Test results indicated that the predominant failure mode was the film's crazing under tensile stress. The inherent columnar structure of the beryllium films deposited under normal conditions in detrimental to the tensile strength of the films and may be responsible for this type of failure. We successfully suppressed the inherent columnar growth in beryllium films by incorporating periodic N{sub 2} pulses during sputter deposition. Quantitative analyses were conducted for nitrogen and oxygen contamination in the beryllium films using standards prepared by ion implantation. Secondary ion mass spectroscopy (SIMS) depth profiles were obtained for oxygen and nitrogen using mass isotopes {sup 16}O and 23({sup 9}Be + {sup 14}N).
- Authors:
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- DOE/DP
- OSTI Identifier:
- 5487822
- Report Number(s):
- UCRL-98780; CONF-891093-13
Journal ID: ISSN 0734--2101; ON: DE90003058
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Conference
- Resource Relation:
- Journal Volume: 8; Journal Issue: 3; Conference: 36. American Vacuum Society national vacuum symposium, Boston, MA (USA), 23-27 Oct 1989
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; BERYLLIUM; THIN FILMS; MICROANALYSIS; DEPOSITION; FAILURES; MICROSTRUCTURE; NITROGEN; PULSES; QUANTITATIVE CHEMICAL ANALYSIS; SPUTTERING; SUBSTRATES; TENSILE PROPERTIES; ALKALINE EARTH METALS; CHEMICAL ANALYSIS; CRYSTAL STRUCTURE; ELEMENTS; FILMS; MECHANICAL PROPERTIES; METALS; NONMETALS; 360102* - Metals & Alloys- Structure & Phase Studies; 360103 - Metals & Alloys- Mechanical Properties
Citation Formats
Hsieh, E. J., Price, C. W., Pierce, E. L., and Wirtenson, G. R. Effects of nitrogen pulsing on sputter-deposited beryllium films. United States: N. p., 1989.
Web. doi:10.1116/1.577034.
Hsieh, E. J., Price, C. W., Pierce, E. L., & Wirtenson, G. R. Effects of nitrogen pulsing on sputter-deposited beryllium films. United States. https://doi.org/10.1116/1.577034
Hsieh, E. J., Price, C. W., Pierce, E. L., and Wirtenson, G. R. 1989.
"Effects of nitrogen pulsing on sputter-deposited beryllium films". United States. https://doi.org/10.1116/1.577034. https://www.osti.gov/servlets/purl/5487822.
@article{osti_5487822,
title = {Effects of nitrogen pulsing on sputter-deposited beryllium films},
author = {Hsieh, E. J. and Price, C. W. and Pierce, E. L. and Wirtenson, G. R.},
abstractNote = {Beryllium films have been used as a heat sink'' layer between the reflective coating of a mirror and its glass substrate to improve the mirror's radiation resistance to prompt deposition of x-rays. Under x-ray irradiation, the beryllium heat sink'' layer is subjected to tensile stresses caused by differences in thermal expansion coefficients. Test results indicated that the predominant failure mode was the film's crazing under tensile stress. The inherent columnar structure of the beryllium films deposited under normal conditions in detrimental to the tensile strength of the films and may be responsible for this type of failure. We successfully suppressed the inherent columnar growth in beryllium films by incorporating periodic N{sub 2} pulses during sputter deposition. Quantitative analyses were conducted for nitrogen and oxygen contamination in the beryllium films using standards prepared by ion implantation. Secondary ion mass spectroscopy (SIMS) depth profiles were obtained for oxygen and nitrogen using mass isotopes {sup 16}O and 23({sup 9}Be + {sup 14}N).},
doi = {10.1116/1.577034},
url = {https://www.osti.gov/biblio/5487822},
journal = {},
issn = {0734--2101},
number = 3,
volume = 8,
place = {United States},
year = {Wed Aug 09 00:00:00 EDT 1989},
month = {Wed Aug 09 00:00:00 EDT 1989}
}