Formation and microstructural analysis of co-sputtered thin films consisting of cobalt nanograins embedded in carbon
- NTT Integrated Information Energy Systems Laboratories, 3-9-11, Midori-cho, Musashino-Shi, Tokyo 180 (Japan)
Cobalt{endash}carbon thin films were deposited with a carbon concentration ranging from 27 to 57 at.{percent} at different substrate temperatures. The morphology and phases of as-deposited films were investigated by transmission electron microscopy and x-ray diffraction. The effect of annealing on the microstructure is reported. Under particular conditions of substrate temperature, carbon concentration, and subsequent annealing, a granular morphology consisting of nanocrystalline cobalt grains embedded in graphitelike carbon was obtained. The cobalt grains were uniform in size. The particle size could be controlled in the range from 4 to 7 nm by varying the carbon concentration. The cobalt phase was found to depend on the carbon concentration and substrate temperature. The hexagonal close-packed cobalt phase was observed only via the formation of the metastable carbide {delta}{sup {prime}}-Co{sub 2}C and its subsequent decomposition upon annealing. Otherwise the cobalt phase has a heavily faulted close-packed structure or a random stacking structure. {copyright} {ital 1997 American Institute of Physics.}
- OSTI ID:
- 538414
- Journal Information:
- Journal of Applied Physics, Vol. 82, Issue 5; Other Information: PBD: Sep 1997
- Country of Publication:
- United States
- Language:
- English
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