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Title: Development and evaluation of an instrument for rapid electroreflectance of semiconductor materials. Final technical report, 1 February 1988-30 April 1989

Technical Report ·
OSTI ID:5234607

The applications of electron-beam electroreflectance (EBER) to Hg(1-x)Cd(x)Te (MCT) and other semiconductor systems are desired. Temperature dependences of the E1 optical gap of MCT are in agreement with the results of other researchers. For an epitaxial sample, alpha E (1)/alpha T of -(6.7 to 8.2) x .0001 eV/K was obtained. This value is consistent with that determined by Berlouis. The author finds a larger thermal coefficient for epitaxial MCT on CdTe than for bulk MCT. He also measured the E(1) Delta (1) band gap to be nearly 0.63 eV above the E1 transition energy. MCT is more sensitive to electron beam current intensity than other materials due to its relatively poor thermal conductivity. The line shape observed at .001 A/sq.cm appears to be from thermoreflectance (TR), based upon calculations and detailed experimental studies. Therefore, EBER determinations of the temperature dependence of the E1 and E1+Delta (1) band gap energies demonstrate a large variance. The author has collaborated with other researchers on EBER evaluation of MCT growth and dry-etch processes. He has extended EBER studies to other technologically important crystal systems related to MCT. Correlations were found between the EBER measurements of CdTe samples and surface-preparation methods. In the case of GaAs and related compounds, results show promise in the analysis of epitaxial films and heterostructures, which are briefly described.

Research Organization:
Evans (Charles) and Associates, Redwood City, CA (USA)
OSTI ID:
5234607
Report Number(s):
AD-A-211690/3/XAB; CEVANS-057/FR-8901
Country of Publication:
United States
Language:
English

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