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Title: Aerosol chemical vapor deposition of metal oxide films

Patent ·
OSTI ID:5226424

A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said substrate.

DOE Contract Number:
W-7405-ENG-36
Assignee:
PTO; EDB-94-064381
Patent Number(s):
US 5278138; A
Application Number:
PPN: US 7-774748
OSTI ID:
5226424
Resource Relation:
Patent File Date: 11 Oct 1991
Country of Publication:
United States
Language:
English