Oxidation of amorphous Ni--Nb films: Surface spectroscopy studies
Sputter deposited amorphous Ni--Nb alloy films have been proposed as thin-film metallization layers for high-temperature (>300 /sup 0/C) compound semiconductor applications. We have used x-ray photoelectron spectroscopy (XPS) to investigate the oxidation behavior of 1-..mu..m-thick, sputter deposited, amorphous Ni/sub 60/ Nb/sub 40/ films exposed to oxygen or room air at temperatures in the range 30--500 /sup 0/C for times of 5 min to 45 h. The initial stages of oxidation were examined in situ at oxygen partial pressures below 1 x 10/sup -6/ Torr. At all temperatures, Nb/sub 2/ O/sub 5/ formed on the surface; this remained the dominant corrosion product for specimens oxidized in air for 45 h at temperatures up to 200 /sup 0/C. Angle-resolved XPS measurements indicated that a thin (5--10 A) NiO layer formed on the surface of the Nb/sub 2/ O/sub 5/ after long exposures at these temperatures. Specimens oxidized at temperatures above 240 /sup 0/C, however, quickly developed a thick (>100 A), crystalline NiO layer on top of the Nb/sub 2/O/sub 5/.
- Research Organization:
- Corrosion Division 1841, Sandia National Laboratories, Albuquerque, New Mexico 87185
- OSTI ID:
- 5221752
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Vol. 6:3
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
NICKEL BASE ALLOYS
OXIDATION
NIOBIUM ALLOYS
AMORPHOUS STATE
CORROSION
HIGH TEMPERATURE
HIGH VACUUM
MEDIUM TEMPERATURE
NIOBIUM OXIDES
PHOTOELECTRON SPECTROSCOPY
SPUTTERING
THIN FILMS
X RADIATION
ALLOYS
CHALCOGENIDES
CHEMICAL REACTIONS
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
FILMS
IONIZING RADIATIONS
NICKEL ALLOYS
NIOBIUM COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
RADIATIONS
REFRACTORY METAL COMPOUNDS
SPECTROSCOPY
TRANSITION ELEMENT COMPOUNDS
360106* - Metals & Alloys- Radiation Effects