Model for nonequilibrium segregation during pulsed laser annealing

Journal Article · Fri Aug 01 00:00:00 EDT 1980 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.91914· OSTI ID:5220371

Wood, R F

Highly nonequilibrium thermodynamic processes occur during the ultrarapid recrystallization characteristic of pulsed laser annealing. Values of interface segregation coefficients are observed to differ from equilibrium values by as much as three orders of magnitude and equilibrium solubility limits may be exceeded by similar magnitudes. In this letter, a model is developed which accounts quantitatively for these effects.

• Research Organization: Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
• DOE Contract Number: W-7405-ENG-26
• OSTI ID: 5220371
• Journal Information: Appl. Phys. Lett.; (United States), Vol. 37:3
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
SILICON
ANNEALING
LASER-RADIATION HEATING
EQUILIBRIUM
INTERFACES
MATHEMATICAL MODELS
PULSES
RECRYSTALLIZATION
SOLUBILITY
THEORETICAL DATA
THERMODYNAMICS
DATA
ELEMENTS
HEAT TREATMENTS
HEATING
INFORMATION
NUMERICAL DATA
PLASMA HEATING
SEMIMETALS
360605* - Materials- Radiation Effects