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Title: Protective carbon films deposited by dc-bias facing targets sputtering with microscopic ultraflatness and strong sp{sup 3} coordination

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.364554· OSTI ID:496590
 [1];  [2];  [3]
  1. Tokyo Research Laboratory, IBM Japan, 1623-14 Shimotsuruma, Yamato, Kanagawa 242 (Japan)
  2. Storage Systems Division, IBM Japan, 1 Kirihara-cho, Fujisawa 252 (Japan)
  3. Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152 (Japan)

Carbon thin films were deposited on hard disks as protective layers by facing targets sputtering (FTS), and their characteristics were evaluated to determine whether they would be suitable protective layers for thin-film magnetic recording media. The performance and lifetime of a hard disk drive (HDD) are intimately related to the head-disk interface. Increase in performance due to reduction of the flying height and magnetic spacing, and longer product lifetime are related to the properties of protective layers covering the surfaces of hard disks. Currently, such layers are generally sputtered amorphous carbon films, whose characteristics are strongly dependent on various sputtering conditions such as the argon gas pressure, substrate temperature, and dc and rf bias voltages. In this study, the dependence of the characteristics of carbon films on the dc bias voltage of the FTS was investigated, and the characteristics were also compared with those obtained without a dc bias voltage supply. The carbon films were deposited at an argon gas pressure of 0.2 mTorr and a substrate temperature of 25{degree}C as room temperature, with several dc bias voltages and also without any bias voltage. There have been no reports to date of the successful use of such low gas pressures to realize excellent protective layers. The properties of the films were characterized by Raman spectroscopy, and the results were compared with previously reported ones obtained in different sputtering conditions at high argon pressures. Carbon films deposited, without plasma damage, by FTS, with dc bias voltage at argon gas pressures as low as 0.2 mTorr, showed a large population of sp{sup 3} coordination, columnless morphology, and a microscopically flat surface. These are better properties than those obtained with no dc bias voltage, and may lead to an intrinsically excellent protective layer for hard disks. {copyright} {ital 1997 American Institute of Physics.}

OSTI ID:
496590
Report Number(s):
CONF-961141-; ISSN 0021-8979; TRN: 9709M0304
Journal Information:
Journal of Applied Physics, Vol. 81, Issue 8; Conference: 41. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 12-15 Nov 1996; Other Information: PBD: Apr 1997
Country of Publication:
United States
Language:
English

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