Titanium nitride formation at low energy Ar ion bombardment and UV-light irradiation during deposition

Book · Tue Dec 31 00:00:00 EST 1996

OSTI ID:477416

Gerlach, J W; Wengenmair, H; Stritzker, B; Rauschenbach, B ^[1]

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1. Univ. Augsburg (Germany). Inst. fuer Physik

Titanium nitride films were produced by a newly developed photon and ion beam assisted deposition system (PHIBAD system). With an electron beam evaporator titanium was deposited on silicon substrates in a controlled nitrogen environment. The growing {delta}-TiN films were bombarded with argon ions and illuminated with UV-light. The results demonstrate that the impurity content, the nitrogen to titanium ratio of the films, the microstructure and the crystal alignment are changed using UV-light irradiation during ion assisted deposition.

• OSTI ID: 477416
• Report Number(s): CONF-951155-; ISBN 1-55899-299-5; TRN: IM9724%%293
• Resource Relation: Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Ion-solid interactions for materials modification and processing; Poker, D.B. [ed.] [Oak Ridge National Lab., TN (United States)]; Ila, D. [ed.] [Alabama A and M Univ., Normal, AL (United States)]; Cheng, Y.T. [ed.] [General Motors Corp., Warren, MI (United States)]; Harriott, L.R. [ed.] [AT and T Bell Labs., Murray Hill, NJ (United States)]; Sigmon, T.W. [ed.] [Arizona State Univ., Tempe, AZ (United States)]; PB: 923 p.; Materials Research Society symposium proceedings, Volume 396
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
TITANIUM NITRIDES
ENERGY BEAM DEPOSITION
MICROSTRUCTURE
CRYSTAL STRUCTURE
CONTROLLED ATMOSPHERES
ULTRAVIOLET RADIATION
EXPERIMENTAL DATA