Novel applications of ceramic precursors -- TiN coating on alumina and functionally gradient materials

Book · Tue Dec 31 00:00:00 EST 1996

OSTI ID:470900

Seyferth, D ^[1]; Narula, C K ^[2]; Czubarow, P ^[3]

---

1. Massachusetts Inst. of Tech., Cambridge, MA (United States). Dept. of Chemistry
2. Ford Motor Co., Dearborn, MI (United States). Dept. of Chemistry
3. Raychem Corp., Menlo Park, CA (United States)

There are very few demonstrated applications of ceramic precursor technology. Here, the authors describe two new applications of known ceramic precursors, thin film deposition and the fabrication of functionally gradient materials (FGM). To demonstrate the thin film deposition, the authors prepared titanium nitride film on an alumina substrate using (CH{sub 3}){sub 3}SiNHTiCl{sub 3} precursor by a single dipcoat-fire cycle. The fabrication of copper and aluminum based FGMs was demonstrated using Nicalon{reg_sign} fiber polycarbosilane and poly(methylsilane) precursors as binders and in situ sources of ceramics.

• OSTI ID: 470900
• Report Number(s): CONF-951155-; ISBN 1-55899-313-4; TRN: IM9722%%22
• Resource Relation: Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Covalent ceramics III -- Science and technology of non-oxides; Hepp, A.F. [ed.] [National Aeronautics and Space Administration, Cleveland, OH (United States). Lewis Research Center]; Kumta, P.N. [ed.] [Carnegie Mellon Univ., Pittsburgh, PA (United States)]; Sullivan, J.J. [ed.] [MKS Instruments, Andover, MA (United States)]; Fischman, G.S. [ed.] [Food and Drug Administration, Rockville, MD (United States)]; Kaloyeros, A.E. [ed.] [Univ. of Albany, NY (United States)]; PB: 499 p.; Materials Research Society symposium proceedings, Volume 410
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
SURFACE COATING
TITANIUM NITRIDES
COPPER
ALUMINIUM
FABRICATION
COMPOSITE MATERIALS
SILICON CARBIDES
THIN FILMS
ORGANOMETALLIC COMPOUNDS
DIP COATING
PYROLYSIS
BINDERS
LAYERS
SHRINKAGE
EXPERIMENTAL DATA