Anomalous backscattered electron behavior of MoB and Mo{sub 5}SiB{sub 2} (T{sub 2}) phases in an as-cast Mo-B-Si alloy
- Univ. of Wisconsin, Madison, WI (United States)
It is well established that backscattered electron (BSE) image contrast in SEM is primarily associated with differences in mean atomic number (Z) of the phases. The BSE coefficient increases with higher Z with slight dependence on beam energy E{sub 0}, except for some materials at <5 keV. We report here the anomalous BSE behavior of MoB and T{sub 2} (Mo{sub 5}SiB{sub 2}) phases observed imaging a 60Mo-30B-10Si (at%) alloy with a CAMECA SX-50. Specifies of the material and EMPA are reported in a companion communication. Mo-ss and Mo{sub 3}Si are also present. The drastic differences in BSE behavior are shown in Figures 1 (7 keV), 2 (15 keV), 2 (15 keV) and 3 (25 keV). The material has not been coated; addition of 100 {angstrom} carbon does not change the observed behavior.
- OSTI ID:
- 468968
- Report Number(s):
- CONF-960877-; TRN: 97:001308-0226
- Resource Relation:
- Conference: Microscopy and microanalysis 1996, Minneapolis, MN (United States), 11-15 Aug 1996; Other Information: PBD: 1996; Related Information: Is Part Of Microscopy and microanalysis 1996; Bailey, G.W.; Corbett, J.M.; Dimlich, R.V.W.; Michael, J.R.; Zaluzec, N.J. [eds.]; PB: 1107 p.
- Country of Publication:
- United States
- Language:
- English
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