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Title: Wideband tuning of XeCl laser-pumped dye-doped sol-gel silica laser

Abstract

Doped and undoped silica slabs were fabricated using the sol-gel technique. Extended UV transmission was observed for HCl-catalyzed sol-gel silica. Under transverse pumping by a XeCi laser, narrowband (<0.9 nm) laser oscillation from Rhodamine Perchlorate (R640)-doped silica slabs was achieved in an echelle grating resonator cavity. Tuning of the R640 silica laser extended from 627 nm to 670 nm.

Authors:
;  [1];  [2]
  1. Chinese Univ. of Hong Kong (Hong Kong). Physics Dept.
  2. Hong Kong Polytechnic, Hunghom (Hong Kong). Dept. of Applied Physics
Publication Date:
OSTI Identifier:
46118
Resource Type:
Journal Article
Journal Name:
IEEE Photonics Technology Letters
Additional Journal Information:
Journal Volume: 7; Journal Issue: 3; Other Information: PBD: Mar 1995
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; SOLID STATE LASERS; LASER MATERIALS; TUNING; DOPED MATERIALS; OPTICAL PUMPING; EXPERIMENTAL DATA; ULTRAVIOLET RADIATION

Citation Formats

Lam, K S, Lo, D, and Wong, K H. Wideband tuning of XeCl laser-pumped dye-doped sol-gel silica laser. United States: N. p., 1995. Web. doi:10.1109/68.372754.
Lam, K S, Lo, D, & Wong, K H. Wideband tuning of XeCl laser-pumped dye-doped sol-gel silica laser. United States. https://doi.org/10.1109/68.372754
Lam, K S, Lo, D, and Wong, K H. 1995. "Wideband tuning of XeCl laser-pumped dye-doped sol-gel silica laser". United States. https://doi.org/10.1109/68.372754.
@article{osti_46118,
title = {Wideband tuning of XeCl laser-pumped dye-doped sol-gel silica laser},
author = {Lam, K S and Lo, D and Wong, K H},
abstractNote = {Doped and undoped silica slabs were fabricated using the sol-gel technique. Extended UV transmission was observed for HCl-catalyzed sol-gel silica. Under transverse pumping by a XeCi laser, narrowband (<0.9 nm) laser oscillation from Rhodamine Perchlorate (R640)-doped silica slabs was achieved in an echelle grating resonator cavity. Tuning of the R640 silica laser extended from 627 nm to 670 nm.},
doi = {10.1109/68.372754},
url = {https://www.osti.gov/biblio/46118}, journal = {IEEE Photonics Technology Letters},
number = 3,
volume = 7,
place = {United States},
year = {Wed Mar 01 00:00:00 EST 1995},
month = {Wed Mar 01 00:00:00 EST 1995}
}