Application of poly(methyl methacrylate) ultrathin resist supported by a flowing subphase method in electron-beam fabrication of a 4in. high-resolution mask

Journal Article · Wed Jan 01 00:00:00 EST 1997 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.589246· OSTI ID:450297

Gu, N; Qian, F; Hong, Q; Lu, Z; Wei, Y ^[1]; Yu, X; Peng, L; Zhang, Z; Zhao, L; Zhang, H; Liu, Y K ^[2]

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1. National Laboratory of Molecular and Biomolecular Electronics, Southeast University, Nanjing 210096 (China)
2. Wuxi Huajing Electronic Corporation, Center for Fabrication of Mask, Wuxi 214061 (China)

A recently designed Langmuir trough using a steady-laminar flowing subphase is exploited to support polymer monolayers. The ultrathin poly(methyl methacrylate) (PMMA) films prepared by this technique have been explored as high-resolution electron beam resists. The lithographic exposure conditions of Langmuir{endash}Blodgett PMMA films were investigated and the results of fabricating a 4 in. mask with 0.38 {mu}m in feature linewidth and 0.5 {mu}m in resolution were achieved by using the Jeoptic ZBA-23 electron-beam machine as the exposure tool. {copyright} {ital 1997 American Vacuum Society.}

• OSTI ID: 450297
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 15, Issue 1; Other Information: PBD: Jan 1997
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
PMMA
PHYSICAL RADIATION EFFECTS
ELECTRON BEAMS
THIN FILMS
MASKING
INTEGRATED CIRCUITS
POLYMERS
Langmuir-Blodgett films