Influence of Si content on microstructure of TiAl alloys
- Aachen Univ. of Technology (Germany). Central Lab. of Electron Microscopy
- Zhejiang Univ., Hangzhou (China)
- GKSS Research Center, Geesthacht (Germany)
A systematic study of four ternary TiAl-based alloys with constant Ti content of 52.2 at. % and variable Si content ranging from 0.3 to 2.7 at. % (Al in balance) was conducted. The alloys were prepared from elemental powders via a route including powder mixing, precompaction, cold extrusion, and reactive hot-isostatic pressing. All investigated alloys contain the intermetallic compounds {gamma}-TiAl, {alpha}{sub 2}-Ti{sub 3}Al, and {zeta}-Ti{sub 5}(Si,Al){sub 3}. The microstructure can be described as a duplex structure (i.e., lamella {gamma}/{alpha}{sub 2} regions distributed in a {gamma} matrix) containing {zeta} precipitates. With increasing Si content, the number of primary {zeta} precipitates increased and the {gamma} grain size became finer while the lamellar volume fraction decreased slightly.
- OSTI ID:
- 409669
- Report Number(s):
- CONF-9505386-; ISSN 1044-5803; TRN: IM9701%%11
- Journal Information:
- Materials Characterization, Vol. 36, Issue 4-5; Conference: International metallographic conference (MC 95), Colman (France), 10-12 May 1995; Other Information: PBD: Apr-Jun 1996
- Country of Publication:
- United States
- Language:
- English
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