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Title: High throughput fabrication of transition-metal-doped epitaxial ZnO thin films: A series of oxide-diluted magnetic semiconductors and their properties

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1377856· OSTI ID:40204295

Combinatorial laser molecular-beam epitaxy method was employed to fabricate epitaxial ZnO thin films doped with all the 3d transition metal (TM) ions in a high throughput fashion. The solubility behavior of TM ions was discussed from the viewpoints of the ionic radius and valence state. The magneto-optical responses coincident with absorption spectra were observed for Mn- and Co-doped samples. Cathodoluminescence spectra were studied for Cr-, Mn-, Fe-, and Co-doped samples, among which Cr-doped ZnO showed two sharp peaks at 2.97 eV and 3.71 eV, respectively, at the expense of the exciton emission peak of pure ZnO at 3.25 eV. Different magnetoresistance behavior was observed for the samples codoped with n-type carriers. Ferromagnetism was not observed for Cr- to Cu-doped samples down to 3 K. {copyright} 2001 American Institute of Physics.

Sponsoring Organization:
(US)
OSTI ID:
40204295
Journal Information:
Applied Physics Letters, Vol. 78, Issue 24; Other Information: DOI: 10.1063/1.1377856; Othernumber: APPLAB000078000024003824000001; 040123APL; PBD: 11 Jun 2001; ISSN 0003-6951
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English