A new photosensitive dielectric insulating polyester film: Synthesis and characterization
Conference
·
OSTI ID:370885
- Univ. of Illinois, Urbana, IL (United States)
In this paper, we described the synthesis and the characterization of a new dielectric insulating film prepared from a photosensitive polyester. The unique feature of this new photosensitive polyester film is that it can be foamed when cured at 280{degrees}C though interchain transesterification reaction. This process can reduce the dielectric constant of the film to 2.5. Some important properties, such as photosensitivity, thermal stability, mechanical properties of this new dielectric insulating polymer film were discussed. The preliminary results show a good resolution and an acceptable profile of this new insulator after foaming.
- OSTI ID:
- 370885
- Report Number(s):
- CONF-960376-; TRN: 96:003805-0947
- Resource Relation:
- Conference: Spring national meeting of the American Chemical Society (ACS), New Orleans, LA (United States), 24-28 Mar 1996; Other Information: PBD: 1996; Related Information: Is Part Of 211th ACS national meeting; PB: 2284 p.
- Country of Publication:
- United States
- Language:
- English
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